Services
Advanced customized coating technologies
Our coating facilities offer customized thin film deposition solutions for both research and industrial applications.
Check our services and contact us at [email protected]!
Physical Vapor Deposition (PVD) Systems
We operate three state-of-the-art PVD systems for versatile coating applications:
- Two dual-cathode magnetron sputtering systems for film deposition on substrates
- One single-cathode system for film deposition on powders and complex geometries
- One triple-cathode system for advanced multilayer and compositionally graded coatings
These systems enable the development of customized metallic, ceramic, and composite coatings with tailored properties for applications in energy, catalysis, optics, and protective coatings.
Atomic Layer Deposition (ALD)
Our ALD system offers both thermal and plasma-enhanced modes, providing ultra-precise, conformal coating capabilities at the atomic scale. This technology is ideal for:
- Ultra-thin functional films with nanometer-level thickness control
- Conformal coatings on high-aspect-ratio structures and porous materials
- Surface functionalization of catalysts and energy materials
Our Laboratories
The Center can offer the mentioned services thanks to the well-equipped deposition facilities which include
- Double-cathode deposition chamber for PVD (sputtering) and PECVD
Single cathode RF-magnetron deposition chamber for deposition on powders and liquids
3-cathodes Confocal Sputtering System
PECVD and surface treatment chamber
Plasma enhanced and thermal ALD (ALD, PEALD)